Pilot Line 2
Innovation Application Technique for Large-Scale Electrodes
Overview
Spatial Atomic Layer Deposition (S-ALD) can be used in the field of electrolysis to deposit IrO2, Pt and other relevant materials, including mixed oxides on either the membrane or on the PTL. The maximum deposition area is 150 mm x 150 mm. The system can be equipped with a precious metal reclaim facility integrated in the exhaust gas lines to capture any unreacted iridium or platinum precursor from the waste gas flow with a reclaim efficienciy achievable close to 100%. A mask-less patterned deposition system will only deposit the catalyst layer where required. This can further reduce unnecessary supply of precursor at areas where it is not required. The deposited electrocatalyst layers have a low metal loading, high stability and high conformality. The Pilot Line 2 serves as a CCM or PTE supplier within the electrolyser value chain.
Key Characteristics & Goals
- Advanced Manufacturing:
- Large-area and roll-to-roll compatible.
- High deposition rates → Hours become minutes.
- Scalability: Component sizes up to 150 mm x 150 mm can be made. Equipment is being developed to be able to manufacture larger size CCMs or PTE’s.
- Precision: A thin and conformal layer is deposited with a precise loading
Material Innovation: Low-iridium catalyst loading, down to 0.1 mg/cm2 has been demonstrated.
Benefits & Potential
- For Industry: Reduced use of critical raw materials.
- Cost Efficiency: Lower costs by using lower amounts of precious metals and CRM’s.
Performance: No significant loss in performance demonstrated..
